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Proceedings Paper

Hexafluoroisopropyl and trifluoromethyl carbinols in an acrylate platform for 157-nm chemically amplified resists
Author(s): Vladimir Jakubek; Eric A. Robertson; Atteye H. Abdourazak; Thomas J. Markley; John A. Marsella; Christopher K. Ober
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Paper Abstract

Electromagnetic radiation in the vacuum-ultraviolet (VUV) region is needed for imaging of very fine features at the 65 nm and 45 nm nodes. Photolithography using 157-nm radiation, emitted from an F2 excimer laser, is a candidate for next generation lithography. Only chemically amplified resists containing fluorinated hydrocarbons and siloxanes have the required transparency at this wavelength. We have identified hexafluoroisopropanol units as a building block for our 157-nm resist polymers. This paper reports our progress on the most recent research development for this platform. The hexafluoroisopropanol functionality, which has a pKa similar to phenol, has been used to increase the transparency of 157-nm single-layer acrylate-based resists. Our recent effort has been focused on the syntheses of new acrylate monomers with highly transparent building blocks based on trifluoroacetone. The first example, a homopolymer derived from trifluoroacetone bearing a fluorinated hemiacetal unit, has moderate transparency at 157 nm (A = 1.9 μm-1). We have also introduced a new acrylate monomer containing a trimer based on trifluoroacetone, where the 6-hydroxy group in the hemiacetal unit is substituted by a fluorine atom, with an acceptable transparency at 157 nm (A = 2.1 μm-1). Copolymers of the former monomer, derived from trifluoroacetone, and tert-butyl α-fluoroacrylate have also been prepared and showed good 248-nm lithographic performance suggesting suitability for 157-nm lithography. This paper will discuss the transparency, etch resistance and chemical properties of several fluorinated acrylate-based resists, synthesized from groups containing pendent hexafluoroisopropanol units and trimers derived from trifluoroacetone.

Paper Details

Date Published: 14 May 2004
PDF: 11 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.536586
Show Author Affiliations
Vladimir Jakubek, Cornell Univ. (United States)
Eric A. Robertson, Air Products and Chemicals, Inc. (United States)
Atteye H. Abdourazak, Air Products and Chemicals, Inc. (United States)
Thomas J. Markley, Air Products and Chemicals, Inc. (United States)
John A. Marsella, Air Products and Chemicals, Inc. (United States)
Christopher K. Ober, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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