Share Email Print
cover

Proceedings Paper

Multivariable versus univariable APC
Author(s): Kamyar Faron; Mark Freeland; Ole Krogh; Sukesh Patel; Gayathri Raghavendra
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The need for process control in the semiconductor industry has been established and the benefits have been demonstrated. In the past, process control applications in the semiconductor manufacturing have relied on univariable control schemes. In the case of poly gate etch control methods have manipulated trim time or O2 flow to maintain a target poly gate FI CD target as the input DI CD varies. This study focuses on the impact of process control on secondary output goals and compares the effect of univariable control with that of multivariable control. There are two important conclusions for semiconductor manufacturers: (i) univariable control schemes sacrifice secondary control goals when trying to achieve the primary control goal and (ii) manufacturers must adopt multi-input multi-output control schemes to actively control both secondary process goals and primary control goals.

Paper Details

Date Published: 29 April 2004
PDF: 10 pages
Proc. SPIE 5378, Data Analysis and Modeling for Process Control, (29 April 2004); doi: 10.1117/12.536472
Show Author Affiliations
Kamyar Faron, Blue Control Technologies (United States)
Mark Freeland, Blue Control Technologies (United States)
Ole Krogh, Blue Control Technologies (United States)
Sukesh Patel, Blue Control Technologies (United States)
Gayathri Raghavendra, Blue Control Technologies (United States)


Published in SPIE Proceedings Vol. 5378:
Data Analysis and Modeling for Process Control
Kenneth W. Tobin, Editor(s)

© SPIE. Terms of Use
Back to Top