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Proceedings Paper

Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources
Author(s): Ernesto Vargas Lopez; Brian E. Jurczyk; Michael A. Jaworski; Martin J. Neumann; David N. Ruzic
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Paper Abstract

RF plasma based mitigation has been studied as an improved debris mitigation scheme for extreme ultraviolet (EUV) sources. The RF plasma ionizes sputtered neutral debris and, when used in conjunction with a collimator (also known as a foil trap), inhibits that debris from reaching the collector optics. An ionization fraction of 61±3% has been measured. In addition, increased scattering of the ion component of the debris has led to a decrease in erosive flux reaching the diagnostics. Results from in-situ high-precision quartz crystal oscillators, ex-situ surface characterization (Auger, XPS), and secondary plasma characterization is presented for a series of mitigation schemes, including a foil trap in conjunction with the RF plasma.

Paper Details

Date Published: 20 May 2004
PDF: 14 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.536405
Show Author Affiliations
Ernesto Vargas Lopez, Univ. of Illinois/Urbana-Champaign (United States)
Brian E. Jurczyk, Univ. of Illinois/Urbana-Champaign (United States)
Michael A. Jaworski, Univ. of Illinois/Urbana-Champaign (United States)
Martin J. Neumann, Univ. of Illinois/Urbana-Champaign (United States)
David N. Ruzic, Univ. of Illinois/Urbana-Champaign (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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