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Proceedings Paper

Sub-0.25-pm 50-W amplified excimer laser system for 193-nm lithography
Author(s): Sergei V. Govorkov; Alexander O. Wiessner; Gongxue Hua; Timur V. Misuryaev; Andrey N. Knysh; Stefan Spratte; Peter Lokai; Tamas Nagy; Igor Bragin; Andreas Targsdorf; Thomas Schroeder; Hans-Stephan Albrecht; Rainer Desor; Thomas Schmidt; Rainer Paetzel
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Paper Abstract

We report performance parameters of a robust, 50 W, high repetition rate amplified ArF excimer laser system with FWHM bandwidth of less than 0.25 pm, 95% energy content bandwidth of less than 0.55 pm, and ultra-low ASE level. Proprietary design solutions enable stable operation with a substantial reliability margin at this high power level. We report on characterization of all the key parameters of importance for the next generation microlithography tools, such as spectrum and dose control stability, in various operating modes.

Paper Details

Date Published: 28 May 2004
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.536374
Show Author Affiliations
Sergei V. Govorkov, Lambda Physik USA, Inc. (United States)
Alexander O. Wiessner, Lambda Physik USA, Inc. (United States)
Gongxue Hua, Lambda Physik USA, Inc. (United States)
Timur V. Misuryaev, Lambda Physik USA, Inc. (United States)
Andrey N. Knysh, Lambda Physik USA, Inc. (United States)
Stefan Spratte, Lambda Physik AG (Germany)
Peter Lokai, Lambda Physik AG (Germany)
Tamas Nagy, Lambda Physik AG (Germany)
Igor Bragin, Lambda Physik AG (Germany)
Andreas Targsdorf, Lambda Physik AG (Germany)
Thomas Schroeder, Lambda Physik AG (Germany)
Hans-Stephan Albrecht, Lambda Physik AG (Germany)
Rainer Desor, Lambda Physik AG (Germany)
Thomas Schmidt, Lambda Physik AG (Germany)
Rainer Paetzel, Lambda Physik AG (Germany)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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