Share Email Print

Proceedings Paper

Minimizing mask complexity for advanced optical lithography
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The extension of optical lithography to ever deeper sub-wavelength feature sizes has led to an alarming increase in photo-mask complexity and associated cost. Changes in design philosophy can play a key role in mitigating this trend. We propose the introduction of a new optimization cycle early in the physical design process based on minimizing pattern complexity. We study the use of a pattern complexity metric based on Fourier coding to accomplish such an optimization. The ultimate goal is simplification of resolution enhancement technology (RET) methods required for a given design and the generation of a correspondingly simpler and more cost effective mask set.

Paper Details

Date Published: 3 May 2004
PDF: 9 pages
Proc. SPIE 5379, Design and Process Integration for Microelectronic Manufacturing II, (3 May 2004); doi: 10.1117/12.536369
Show Author Affiliations
Michael Fritze, MIT Lincoln Lab. (United States)
Brian Tyrrell, MIT Lincoln Lab. (United States)

Published in SPIE Proceedings Vol. 5379:
Design and Process Integration for Microelectronic Manufacturing II
Lars W. Liebmann, Editor(s)

© SPIE. Terms of Use
Back to Top