Share Email Print

Proceedings Paper

Methodology and practical application of an ArF resist model calibration
Author(s): Ralf Ziebold; Bernd Kuchler; Christoph Nolscher; Martin Robiger; Klaus Elian; Bernd Tollkuhn
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper focuses on a novel methodology for a fast and efficient resist model calibration. One of the most crucial parts when calibrating a resist model is the fitting of experimental data where up to 20 resist model parameters are varied. Although general optimization approaches such as simplex algorithms or genetic algorithms have proven suitable for many applications, they do not exploit specific properties of resist models. Therefore, we have developed a new strategy based on Design of Experiment methods which makes use of these specific characteristics. This algorithm will be outlined and then be demonstrated by applying it to the calibration of a Solid-C resist model for one ArF line/space resist. As characterizing dataset we chose: a) a Focus Exposure Matrix (FEM) for the dense array, b) linearity, c) OPE (optical proximity) curve and e) the MEEF (mask error enhancement factor) for a dense array. It turned out that a simultaneous fit of the complete data set was not possible by varying resist parameters only. Considering the optical parameters appeared to be crucial as well. Therefore the influence of the optical settings (illumination, projection, 3D mask effects) on the lithography process will be discussed at this point. Finally we obtained an excellent matching of model predictions and experimental results.

Paper Details

Date Published: 14 May 2004
PDF: 9 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.536343
Show Author Affiliations
Ralf Ziebold, Infineon Technologies AG (Germany)
Bernd Kuchler, Infineon Technologies AG (Germany)
Christoph Nolscher, Infineon Technologies AG (Germany)
Martin Robiger, Infineon Technologies AG (Germany)
Klaus Elian, Infineon Technologies AG (Germany)
Bernd Tollkuhn, Fraunhofer-Institut fur Integrierte Systeme und Bauelementetechnologie (Germany)

Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

© SPIE. Terms of Use
Back to Top