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Proceedings Paper

Realization of sub-80nm small space patterning in ArF photolithography
Author(s): Si-Hyun Kim; Hyung-Do Kim; Si-Hyeung Lee; Chang-Min Park; Man-Hyoung Ryoo; Gi-Sung Yeo; Jung-Hyeon Lee; Han-Ku Cho; Woo-Sung Han; Joo-Tae Moon
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Paper Abstract

In optical lithography, small space patterning is the most difficult task. The direct small-space patterning is not good enough with resolution enhancement technique (RET) in sub-80 nm level. Two sequential processes normally achieve the small space. Once the pattern is forming a larger pattern normally, and then makes them shrink to fit to the designed size by additional process. Usually resist thermal flow process has been used to obtain small space as additional process, which has several process issues such as flow amount control of isolated and dense small contacts, uniformity degradation and bowing profile. In order to solve these issues, we introduced the resolution enhancement lithography assisted by chemical shrink (RELACS) and shrink assist film for enhancement resolution (SAFIER) process in ArF lithography. In this paper, the RELACS and SAFIER process are compared with the resist thermal flow process for sub-80 nm space using ArF exposure tool. With the application of this process, we confirmed the improvement of in-wafer uniformity and the successful implementation of sub-80nm small space patterning regardless of pitch size and pattern arrangement.

Paper Details

Date Published: 14 May 2004
PDF: 9 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.536340
Show Author Affiliations
Si-Hyun Kim, Samsung Electronics Co., Ltd. (South Korea)
Hyung-Do Kim, Samsung Electronics Co., Ltd. (South Korea)
Si-Hyeung Lee, Samsung Electronics Co., Ltd. (South Korea)
Chang-Min Park, Samsung Electronics Co., Ltd. (South Korea)
Man-Hyoung Ryoo, Samsung Electronics Co., Ltd. (South Korea)
Gi-Sung Yeo, Samsung Electronics Co., Ltd. (South Korea)
Jung-Hyeon Lee, Samsung Electronics Co., Ltd. (South Korea)
Han-Ku Cho, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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