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Proceedings Paper

EUV wavefront metrology system in EUVA
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Paper Abstract

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

Paper Details

Date Published: 20 May 2004
PDF: 11 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.536327
Show Author Affiliations
Takayuki Hasegawa, Extreme Ultraviolet Lithography System Development Association (Japan)
Chidane Ouchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Masanobu Hasegawa, Extreme Ultraviolet Lithography System Development Association (Japan)
Seima Kato, Extreme Ultraviolet Lithography System Development Association (Japan)
Akiyoshi Suzuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsumi Sugisaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Jun Saito, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Himeji Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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