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Proceedings Paper

Sub-nanometer-precision in measuring ArF-resist patterns
Author(s): Hiroki kawada; Satoru Iwama; Takashi Iizumi; Tadashi Otaka
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Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, ; doi: 10.1117/12.536142
Show Author Affiliations
Hiroki kawada, Hitachi High-Technologies Corp. (Japan)
Satoru Iwama, Hitachi High-Technologies Corp. (Japan)
Takashi Iizumi, Hitachi High-Technologies Corp. (Japan)
Tadashi Otaka, Hitachi High-Technologies Corp. (Japan)


Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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