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Proceedings Paper

Three-dimensional measurement by tilting and moving the objective lens in CD-SEM (II)
Author(s): Kazuo Abe; Kouji Kimura; Yasuko Tsuruga; Shin-ichi Okada; Hitoshi Suzuki; Nobuo Kochi; Hirotami Koike; Akira Hamaguchi; Yuichiro Yamazaki
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Paper Abstract

We report about three-dimensional measurement by CD-SEM. Last year, we reported that the new T-MOL (Tilting and Moving Objective Lens) electron optical system enabled the capture of tilt images without deterioration of the resolution and confirmed that the T-MOL system provides 4 nm resolution at tilting angle 5 degrees. In this year we developed and evaluated the new objective lens and the new octapole deflector for increase of tilting angle and improvement in resolution, and we confirmed that the new electron optical system provides 3.6 nm resolution at tilting angle 8 degrees. Moreover, we report the optimization of the stereo matching technique based on the tilting picture using the actual semiconductor device for measurement 3D analysis.

Paper Details

Date Published: 24 May 2004
PDF: 6 pages
Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); doi: 10.1117/12.536134
Show Author Affiliations
Kazuo Abe, TOPCON Corp. (Japan)
Kouji Kimura, TOPCON Corp. (Japan)
Yasuko Tsuruga, TOPCON Corp. (Japan)
Shin-ichi Okada, TOPCON Corp. (Japan)
Hitoshi Suzuki, TOPCON Corp. (Japan)
Nobuo Kochi, TOPCON Corp. (Japan)
Hirotami Koike, TOPCON Corp. (Japan)
Akira Hamaguchi, Toshiba Corp. (Japan)
Yuichiro Yamazaki, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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