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Proceedings Paper

Combined nanoimprint and photolithography technique with a hybrid mold
Author(s): Xing Cheng; Meng-Han Chang; L. Jay Guo
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Paper Abstract

Nanoimprint lithography (NIL) has been successfully employed in nanoscale patterning, however, it is known to have limitations in replicating large scale (hundreds of microns and larger) and nanoscale patterns simultaneously. We present a new lithographic technique that integrates photolithography into the NIL patterning process. This technique uses a hybrid mold that has large metal pads embedded in a transparent NIL mold. Such a hybrid mold allows both large and nanoscale patterns to be replicated in one step by a combination of imprinting and photolithography. In addition, this new technique offers the advantages of simplifying residual layer distribution and avoiding NIL failures resulting from insufficient polymer flow, and can also eliminate the oxygen plasmon etching process used in NIL to remove the residual polymers.

Paper Details

Date Published: 20 May 2004
PDF: 11 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.536121
Show Author Affiliations
Xing Cheng, Univ. of Michigan (United States)
Meng-Han Chang, Univ. of Michigan (United States)
L. Jay Guo, Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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