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Precise and robust LER and CD SEM measurements
Author(s): Arkady Nikitin; Dmitry Yeremin; Al Sicignano; Tim Goldburt
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Date Published:
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Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, ; doi: 10.1117/12.536113
Show Author Affiliations
Arkady Nikitin, Nanometrology LLC (United States)
Dmitry Yeremin, Nanometrology LLC (United States)
Al Sicignano, Nanometrology LLC (United States)
Tim Goldburt, Nanometrology LLC (United States)


Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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