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Proceedings Paper

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography
Author(s): Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Hiroshi Someya; Hideo Hoshino; Masaki Nakano; Georg Soumagne; Hiroshi Komori; Yuichi Takabayashi; Hakaru Mizoguchi; Akira Endo; Koichi Toyoda; Yasuhiro Horiike
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Paper Abstract

The main technological challenge of a future extreme ultraviolet (EUV) light source is the required average power of 115W at the intermediate focus. High repetition rate laser produced plasma (LPP) sources are very promising to face this challenge. We report the current status of the laser produced light source system we started to develop in 2002. The system consists of the following main components: The plasma target is a liquid xenon jet with a maximum diameter of 50 micrometer and a velocity of more than 30 m/s. A Nd:YAG laser oscillating at 1064 nm produces the plasma. The laser is a master oscillator power amplifier (MOPA) configuration with a maximum repetition rate of 10 kHz and an average power of 1kW. The EUV system currently delivers an average EUV in-band power of 4 W (2% bandwidth, 2π sr) having a stability of 0.54 % (1σ, 50-pulse moving average). In order to evaluate a further increase of the repetition rate, xenon jet characteristics and EUV plasma images have been investigated at 10 kHz. In addition, a conversion efficiency of 0.67% (2% bw, 2π sr) has been obtained at low repetition rate operation. This paper presents the progress of our LPP light source development.

Paper Details

Date Published: 20 May 2004
PDF: 8 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.536076
Show Author Affiliations
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Yousuke Imai, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Someya, Extreme Ultraviolet Lithography System Development Association (Japan)
Hideo Hoshino, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Nakano, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Yuichi Takabayashi, Extreme Ultraviolet Lithography System Development Association (Japan)
Hakaru Mizoguchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)
Yasuhiro Horiike, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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