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Proceedings Paper

High-repetition-rate MPC generator-driven capillary Z-pinch EUV source
Author(s): Yusuke Teramoto; Hiroto Sato; Kazunori Bessho; Takahiro Shirai; Daiki Yamatani; Tetsu Takemura; Toshio Yokota; Kohkan C. Paul; Kiyoyuki Kabuki; Koji Miyauchi; Mitsuru Ikeuchi; Keisuke Okubo; Kazuaki Hotta; Masaki Yoshioka; Koichi Toyoda
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Paper Abstract

Discharge-produced plasma (DPP) based EUV source have been studied and developed at EUVA/Gotenba Branch. Among the several kinds of discharge scheme, a capillary Z-pinch has been employed in our source. An all-solid-state magnetic pulse compression (MPC) generator was used to create a Z-pinch plasma. Low inductance MPC generator provides a pulsed current with about 17 kA of peak amplitude and 350 ns of pulse duration, and allows 2-kHz continuous operation. A water-cooled discharge head was coupled with the MPC generator. In order to evaluate the source performance, electrical energy input to the discharge, EUV radiation power, radiation spatial profile, pinhole image and spectra were observed. 54.4 W/2%BW of 13.5-nm EUV output was achieved at 2-kHz operation. Through the radiation profile measurement and pinhole-camera observation, spatial image of EUV radiation was understood.

Paper Details

Date Published: 20 May 2004
PDF: 8 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.536036
Show Author Affiliations
Yusuke Teramoto, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroto Sato, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazunori Bessho, Extreme Ultraviolet Lithography System Development Association (Japan)
Takahiro Shirai, Extreme Ultraviolet Lithography System Development Association (Japan)
Daiki Yamatani, Extreme Ultraviolet Lithography System Development Association (Japan)
Tetsu Takemura, Extreme Ultraviolet Lithography System Development Association (Japan)
Toshio Yokota, Ushio Inc. (Japan)
Kohkan C. Paul, Ushio Inc. (Japan)
Kiyoyuki Kabuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Koji Miyauchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Mitsuru Ikeuchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Keisuke Okubo, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazuaki Hotta, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Yoshioka, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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