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Proceedings Paper

Understanding focus in projection lithography systems
Author(s): Pary Baluswamy; Hiroyuki Yamamoto; Zornitza Krasteva; Linda Somerville
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Paper Abstract

Characterizing best focus for lithographic patterns is a very common task. It has been observed that the estimated best focus changes considerably with substrate type and substrates change quite frequently in process development. Such effects are seen even when the resist thickness is not altered. In this paper we will present data to identify the cause of the change and throw some light on the interaction between substrate and scanner leveling system.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.536028
Show Author Affiliations
Pary Baluswamy, Micron Technology, Inc. (United States)
Hiroyuki Yamamoto, Micron Japan (Japan)
Zornitza Krasteva, Micron Technology, Inc. (United States)
Linda Somerville, Micron Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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