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Proceedings Paper

DOE manufacture with the DUV SLM-based Sigma7300 laser pattern generator
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Paper Abstract

This paper treats a for the semiconductor industry somewhat different application: The first-ever manufacture of Diffractive Optical Elements (DOE’s) as directly written multilevel diffractive micro-reliefs using the DUV SLM-based Sigma7300 Mask. The reliefs were manufactured in the DUV Chemically Amplified Resist (CAR) FEP-171. This particular application is of direct interest since DOE’s are already incorporated in the Sigma7300 system. The design and manufacture are demonstrated with (1.) A Fan-out element and (2.) A logotype generator. The first attempts, reported here, resulted in a Fan-out element with diffraction efficiency of 64% compared to the theoretical design of 88%.

Paper Details

Date Published: 28 May 2004
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535767
Show Author Affiliations
Peter Björnängen, Micronic Laser Systems AB (Sweden)
Mats Ekberg, Micronic Laser Systems AB (Sweden)
Thomas Öström, Micronic Laser Systems AB (Sweden)
Hans A. Fosshaug, Micronic Laser Systems AB (Sweden)
Johan Karlsson, Micronic Laser Systems AB (Sweden)
Charles Björnberg, Micronic Laser Systems AB (Sweden)
Fredrik K. Nikolajeff, Uppsala Univ. (Sweden)
Mikael Karlsson, Uppsala Univ. (Sweden)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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