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Proceedings Paper

Dynamic numerical aperture for optimized scatterometry
Author(s): Boaz Brill; Yoel Cohen; Shahar Gov; Igor Turovetz; Michael Winik
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Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, ; doi: 10.1117/12.535758
Show Author Affiliations
Boaz Brill, Nova Measuring Instruments Ltd. (Israel)
Yoel Cohen, Nova Measuring Instruments Ltd. (Israel)
Shahar Gov, Nova Measuring Instruments Ltd. (Israel)
Igor Turovetz, Nova Measuring Instruments Ltd. (Israel)
Michael Winik, Nova Measuring Instruments Ltd. (Israel)


Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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