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Proceedings Paper

Nanostructuring of polymers by hot embossing lithography
Author(s): Hella-Christin Scheer; Thomas Glinsner; Matthias Wissen; Rainer Pelzer
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Paper Abstract

While researchers of ever more advanced NGL systems are still struggling to demonstrate the feasibility to manufacture features well below 100 nm at an affordable cost and a reasonable throughput, nanoimprint technologies are emerging as a possible answer to these challenges. 100 nm patterns are imprinted with a fully patterned 4 inch diameter stamp in a low-temperature embossing process. In low temperature imprinting processes with polymers having very low glass transition temperatures heating and cooling cycles are minimized. This enables to increase the throughput of a hot embossing process, which is important for potential industrial applications.

Paper Details

Date Published: 20 May 2004
PDF: 6 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.535741
Show Author Affiliations
Hella-Christin Scheer, Univ. of Wuppertal (Germany)
Thomas Glinsner, EV Group (Austria)
Matthias Wissen, Univ. of Wuppertal (Germany)
Rainer Pelzer, EV Group (Austria)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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