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Proceedings Paper

200-mW continuous-wave laser source at 198.5 nm for lithographic applications
Author(s): Andrea Caprara; Stuart Butterworth; Yefim Kil; Tracy Thonn; Keith Hubbard; Alan Macleod; Edward Rea; Colin Seaton; Luis Spinelli
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Paper Abstract

We report on the development and testing of a laser system that delivers up to 200 mW of continuous-wave radiation at 198.54 nm in a near diffraction-limited beam, to be used as a source for photolithography mask writing and mask inspection. The source has been developed with the support of International SEMATECH. The laser output is obtained by intra-cavity sum frequency generation in a CLBO (Cesium Lithium Borate) non-linear crystal

Paper Details

Date Published: 28 May 2004
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535669
Show Author Affiliations
Andrea Caprara, Coherent, Inc. (United States)
Stuart Butterworth, Coherent, Inc. (United States)
Yefim Kil, Coherent, Inc. (United States)
Tracy Thonn, Coherent, Inc. (United States)
Keith Hubbard, Coherent, Inc. (United States)
Alan Macleod, Coherent, Inc. (United States)
Edward Rea, Coherent, Inc. (United States)
Colin Seaton, Coherent, Inc. (United States)
Luis Spinelli, Coherent, Inc. (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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