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Proceedings Paper

Effect of background exposure dose upon line-edge roughness (LER)
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Paper Abstract

LER is found to correlate strongest with the background, or flare, portion of the lithographic aerial image contrast, when compared with the image slope and “standard” (max - min)/(max + min) contrast. A large pool of collected data and rigorous statistical analysis of variance conclude with far greater than 99% confidence that as any of these measures of aerial image profile degrade, LER increases. However, the relation between background exposure and LER is by far the most significant.

Paper Details

Date Published: 14 May 2004
PDF: 10 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.535623
Show Author Affiliations
Mike V. Williamson, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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