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Proceedings Paper

New concepts in OPC
Author(s): Nick Cobb; Yuri Granik
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Paper Abstract

In this paper, we will discuss two new concepts to be used in model-based OPC: model-based fragmentation, and model tagging to account for long-range proximity effects. In model-based fragmentation we create an initial fragmentation consisting of small fragmentation across the design. Then, specific fragments are removed according to image criteria in order to keep only those fragmentation points which affect the aerial image the most. Optical flare and long-range etch effects are challenging because they have long interaction ranges. We describe here an edge tagging technique that binds different models to different regions on the layout enabling aberration- or density- sensitive corrections. We show application of this technique on a layout section. We discuss how to implement these techniques in practice and what impact they have on OPC speed and accuracy.

Paper Details

Date Published: 28 May 2004
PDF: 11 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535605
Show Author Affiliations
Nick Cobb, Mentor Graphics Corp. (United States)
Yuri Granik, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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