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Proceedings Paper

Reactive dissolution kinetics of lithographic copolymers
Author(s): William Hinsberg; Frances A. Houle; Hiroshi Ito
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Paper Abstract

A wide range of phenomenological nonlinear dissolution behaviors has often been noted for real resist systems but no comprehensive framework has yet been proposed that explains the underlying physical phenomena and connects them to resist composition. We present a taxonomy of dissolution processes in representative resist copolymers measured using quartz crystal microbalance frequency-resistance analysis and optical reflectance measurements. The underlying physical and chemical processes leading to the observed behaviors are identified using a detailed chemical kinetics implementation of the critical ionization model for resist polymer dissolution.

Paper Details

Date Published: 14 May 2004
PDF: 8 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.535599
Show Author Affiliations
William Hinsberg, IBM Almaden Research Ctr. (United States)
Frances A. Houle, IBM Almaden Research Ctr. (United States)
Hiroshi Ito, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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