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Proceedings Paper

Process effects in flare measurement
Author(s): Pary Baluswamy; Linda Somerville
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Paper Abstract

Flare has become a significant problem for low K1 lithography. Several authors have reported measurement of flare in projection lenses. Most of the work is based on the Flagello-Kirk method using resist clearing dose. To measure the flare reliably and accurately using this method the contribution of the process needs to be understood. In this paper we present data looking at the influence of such effects on the measured flare.

Paper Details

Date Published: 28 May 2004
PDF: 6 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535474
Show Author Affiliations
Pary Baluswamy, Micron Technology, Inc. (United States)
Linda Somerville, Micron Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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