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Proceedings Paper

Application of a backside alignment scheme for processing very thick epitaxial layers
Author(s): Alexander Friz; Keith Best; Peter ten Berge; Ghassan Malek
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Date Published:
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Proc. SPIE 5377, Optical Microlithography XVII, ; doi: 10.1117/12.535413
Show Author Affiliations
Alexander Friz, ASML (United States)
Keith Best, ASML (United States)
Peter ten Berge, ASML (Netherlands)
Ghassan Malek, International Rectifier Corp. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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