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Proceedings Paper

Projection maskless lithography
Author(s): Christoph Brandstatter; Hans Loeschner; Gerhard Stengl; Gertraud Lammer; Herbert Buschbeck; Elmar Platzgummer; Hans-Joachim Doring; Thomas Elster; Olaf Fortagne
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Paper Abstract

Recent studies have shown the feasibility of Projection Mask-Less Lithography (PML2) for small and medium volume device production (2-5 WPH) for the 45nm technology node. This PML2 tool concept comprises a combined electrostatic-magnetic electron optical column with 200x de-magnification factor. Instead of a mask there is a programmable aperture plate enabling dynamic beam structuring. Wafer exposure is done stripe-by-stripe with a scanning 300mm wafer stage. Detailed calculations of the PML2 optical column (2-step demagnification) including Monte-Carlo simulations of Coulomb interactions are presented. The extendibility of PML2 technology for the 32nm node will be discussed.

Paper Details

Date Published: 20 May 2004
PDF: 9 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.535412
Show Author Affiliations
Christoph Brandstatter, IMS Nanofabrication GmbH (Austria)
Hans Loeschner, IMS Nanofabrication GmbH (Austria)
Gerhard Stengl, IMS Nanofabrication GmbH (Austria)
Gertraud Lammer, IMS Nanofabrication GmbH (Austria)
Herbert Buschbeck, IMS Nanofabrication GmbH (Austria)
Elmar Platzgummer, IMS Nanofabrication GmbH (Austria)
Hans-Joachim Doring, Leica Microsystems Lithography GmbH (Germany)
Thomas Elster, Leica Microsystems Lithography GmbH (Germany)
Olaf Fortagne, Leica Microsystems Lithography GmbH (Germany)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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