Share Email Print
cover

Proceedings Paper

Particle-cluster tin target for a high-conversion efficiency LPP source for EUVL
Author(s): Toshihisa Tomie; Tatsuya Aota; Jing Quan Lin; Yoshifumi Ueno; Hidehiko Yashiro; Noriaki Kandaka; Hiroki Moriwaki; Gohta Niimi; Isao Matsushima; Kentaro Nishigori
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Particle-cluster tin target is presented as the solution of a 100W EUV source for EUVL. Theory for maximizing conversion efficiency of a laser-produced plasma is derived and the theory is experimentally confirmed by using a dispersed SnO2 particles. The EUV intensity 4 times higher than that from a plasma on a solid Sn plate target is observed at the optimized density. The achieved conversion efficiency for dispersed particles is estimated to be as high as 3%/(2π str 2%BW) or higher from the value for a Sn plate of 0.8% measured by using two multilayer mirrors and a calibrated photodiode. Theoretical consideration reveals that larger diameter plasma enables higher EUV power. The particle-cluster can be delivered at multi kHz rep-rate by using water droplet. Experimental confirmation of delivering particles by droplets is also reported.

Paper Details

Date Published: 20 May 2004
PDF: 11 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.535395
Show Author Affiliations
Toshihisa Tomie, National Institute of Advanced Industrial Science (Japan)
Tatsuya Aota, Japan Society for the Promotion of Science (Japan)
Jing Quan Lin, National Institute of Advanced Industrial Science (Japan)
Yoshifumi Ueno, MIRAI/Association of Super-Advanced Electronics Technologies (Japan)
Hidehiko Yashiro, National Institute of Advanced Industrial Science (Japan)
Noriaki Kandaka, MIRAI/Association of Super-Advanced Electronics Technologies (Japan)
Hiroki Moriwaki, National Institute of Advanced Industrial Science (Japan)
Gohta Niimi, National Institute of Advanced Industrial Science (Japan)
Isao Matsushima, National Institute of Advanced Industrial Science (Japan)
Kentaro Nishigori, National Institute of Advanced Industrial Science (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

© SPIE. Terms of Use
Back to Top