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Proceedings Paper

Combination of hydrogen blistering with e-beam lithography
Author(s): Alexandre Giguère; Bernard Terreault; Jean Beerens; Vincent Aimez; Jacques Beauvais
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Proc. SPIE 5374, Emerging Lithographic Technologies VIII, ; doi: 10.1117/12.535269
Show Author Affiliations
Alexandre Giguère, Univ. du Québec (Canada)
Bernard Terreault, Univ. du Québec (Canada)
Jean Beerens, Univ. de Sherbrooke (Canada)
Vincent Aimez, Univ. de Sherbrooke (Canada)
Jacques Beauvais, Univ. de Sherbrooke (Canada)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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