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Proceedings Paper

Characterization of new ultrathick chemically amplified positive-tone photoresists suitable for electroplating application
Author(s): Anja Voigt; Marina Heinrich; Gabi Gruetzner
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Paper Abstract

There is an increasing need for highly viscous and easy to process thick and ultra thick photoresists for the production of Micro-Electro-Mechanical-Systems (MEMS) and advanced packaging. Here we present results with some novel positive tone photoresists formulated for this purpose. For that we transfered the concept of chemically amplified resists (CARs), originally designed to meet the IC-industry demands for miniaturization and higher resolution, to highly viscous resists. Various polymeric materials have been tested regarding their use in thick CARs. Appropriate resist formulations were developed and their lithographic performance was investigated in a thickness range of 50-150 microns. The CARs are sensitive to UV400.

Paper Details

Date Published: 14 May 2004
PDF: 9 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.535205
Show Author Affiliations
Anja Voigt, micro resist technology GmbH (Germany)
Marina Heinrich, micro resist technology GmbH (Germany)
Gabi Gruetzner, micro resist technology GmbH (Germany)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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