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Proceedings Paper

Dependence of ArF resist on exposed area ratio
Author(s): Eishi Shiobara; Kenji Chiba; Kei Hayasaki; Daisuke Kawamura
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Paper Abstract

We investigated dependence of ArF resist on Exposed Area Ratio (EAR). Because it can be one of the CD variation factor and it is difficult to correct by OPC. Acrylate polymer based resist showed dependence on EAR. At low EAR, resist showed T-top profile and its CD became large. It could be considered that the profile change was caused by acid evaporation and re-sticking. Resist profile simulation indicated that CD variation appeared at only low EAR. To decreasing the effect of acid evaporation and re-sticking, we tried to increase the amount of acid evaporation by increasing PAB temperature. CD variation by EAR was decreased with increasing PAB temperature.

Paper Details

Date Published: 14 May 2004
PDF: 10 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.535142
Show Author Affiliations
Eishi Shiobara, Toshiba Corp. (Japan)
Kenji Chiba, Toshiba Corp. (Japan)
Kei Hayasaki, Toshiba Corp. (Japan)
Daisuke Kawamura, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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