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Proceedings Paper

Model-based OPC/DRC considering local flare effects
Author(s): Hiroki Futatsuya; Teruyoshi Yao; Morimi Osawa; Kozo Ogino; Hiromi Hoshino; Hiroshi Arimoto; Yasuhide Machida; Satoru Asai
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Paper Abstract

Local flare is caused by scattered light from lens surfaces, and it causes the printed line width to vary or degrades printing accuracy. Consequently, local flare must be taken into account when manufacturing IC devices that use lithography generations of less than 90 nm. In particular, an OPC (Optical Proximity Correction) tool with the ability to compensate local flare effects is required to maintain a high degree of printing accuracy. For model-based OPC to work properly, the predicted line width or shape given by a simulator should show good agreement with experimental results. Local flare intensity is calculated from the optical intensity in the absence of local flare, in order to take diffraction effects into account. An aerial image considering local flare effects is given simply by the sum of optical intensity and local flare intensity. To account for local flare effects in a practical manner, the local flare intensity is converted into a variation in the threshold for OPC/DRC (Design Rules Checking) that predicts the desired shape. This paper describes the impact of local flare, the simulation model including local flare effects, and its results. The simulation results show good agreement with the experimental results, indicating that effective OPC/DRC using this method is possible.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.535076
Show Author Affiliations
Hiroki Futatsuya, Fujitsu Ltd. (Japan)
Teruyoshi Yao, Fujitsu Ltd. (Japan)
Morimi Osawa, Fujitsu Ltd. (Japan)
Kozo Ogino, Fujitsu Ltd. (Japan)
Hiromi Hoshino, Fujitsu Ltd. (Japan)
Hiroshi Arimoto, Fujitsu Ltd. (Japan)
Yasuhide Machida, Fujitsu Ltd. (Japan)
Satoru Asai, Fujitsu Ltd. (Japan)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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