Share Email Print
cover

Proceedings Paper

Estimation of emission efficiency for laser-produced EUV plasmas
Author(s): Toru Kawamura; Atsushi Sunahara; Kouhei Gamada; Kazumi Fujima; Fumihiro Koike; Hiroyuki Furukawa; Takeshi Nishikawa; Akira Sasaki; Takashi Kagawa; Richard More; Takako Kato; Masakatsu Murakami; Vasillii Zhakhovskii; Hajime Tanuma; Takashi Fujimoto; Yoshinori Shimada; Michiteru Yamaura; Kazuhisa Hashimoto; Shigeaki Uchida; Chiyoe Yamanaka; Tomoharu Okuno; Takahiro Hibino; Nobuyoshi Ueda; Ryoji Matsui; Yezheng Tao; Mitsuo Nakai; Keisuke Shigemori; Shinsuke Fujioka; Keiji Nagai; Takayoshi Norimatsu; Hiroaki Nishimura; Katsunobu Nishihara; Noriaki Miyanaga; Yasukazu Izawa
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Extreme Ultra Violet (EUV) light source produced by laser irradiation emits not only the desired EUV light of 13 ~ 14 nm (about 90 eV) but also shorter x-rays. For example, emissions around 4 ~ 8 nm (about 150 ~ 300 eV) and 1 ~ 2.5 nm (about 0.5 ~ 1.2 keV) are experimentally observed from Sn and/or SnO2 plasmas. These emissions are correspond to the N-shell and M-shell transitions, respectively. From the view point of energy balance and efficiency, these transitions should be suppressed. However, they may, to some extent, contribute to provide the 5p and 4f levels with electrons which eventually emit the EUV light and enhance the intensity. To know well about radiative properties and kinematic of the whole plasma, atomic population kinetics and spectral synthesis codes have been developed. These codes can estimate the atomic population with nl-scheme and spectral shapes of the EUV light. Radiation hydrodynamic simulation have been proceeding in this analysis. Finally, the laser intensity dependence of the conversion efficiency calculated by these codes agrees with that of the corresponding experimental results.

Paper Details

Date Published: 20 May 2004
PDF: 8 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.535031
Show Author Affiliations
Toru Kawamura, Institute for Laser Technology (Japan)
Atsushi Sunahara, Institute for Laser Technology (Japan)
Kouhei Gamada, Institute of Laser Engineering/Osaka Univ. (Japan)
Kazumi Fujima, Yamanashi Univ. (Japan)
Fumihiro Koike, Kitasato Univ. (Japan)
Hiroyuki Furukawa, Institute for Laser Technology (Japan)
Takeshi Nishikawa, Okayama Univ. (Japan)
Akira Sasaki, Japan Atomic Energy Research Institute (Japan)
Takashi Kagawa, Nara Women's Univ. (Japan)
Richard More, National Institute for Fusion Science (Japan)
Takako Kato, National Institute for Fusion Science (Japan)
Masakatsu Murakami, Institute of Laser Engineering/Osaka Univ. (Japan)
Vasillii Zhakhovskii, Institute of Laser Engineering/Osaka Univ. (Japan)
Hajime Tanuma, Tokyo Metropolitan Univ. (Japan)
Takashi Fujimoto, Kyoto Univ. (Japan)
Yoshinori Shimada, Institute for Laser Technology (Japan)
Michiteru Yamaura, Institute for Laser Technology (Japan)
Kazuhisa Hashimoto, Institute for Laser Technology (Japan)
Shigeaki Uchida, Institute for Laser Technology (Japan)
Chiyoe Yamanaka, Institute for Laser Technology (Japan)
Tomoharu Okuno, Institute of Laser Engineering/Osaka Univ. (Japan)
Takahiro Hibino, Institute of Laser Engineering/Osaka Univ. (Japan)
Nobuyoshi Ueda, Institute of Laser Engineering/Osaka Univ. (Japan)
Ryoji Matsui, Institute of Laser Engineering/Osaka Univ. (Japan)
Yezheng Tao, Institute of Laser Engineering/Osaka Univ. (Japan)
Mitsuo Nakai, Institute of Laser Engineering/Osaka Univ. (Japan)
Keisuke Shigemori, Institute of Laser Engineering/Osaka Univ. (Japan)
Shinsuke Fujioka, Institute of Laser Engineering/Osaka Univ. (Japan)
Keiji Nagai, Institute of Laser Engineering/Osaka Univ. (Japan)
Takayoshi Norimatsu, Institute of Laser Engineering/Osaka Univ. (Japan)
Hiroaki Nishimura, Institute of Laser Engineering/Osaka Univ. (Japan)
Katsunobu Nishihara, Institute of Laser Engineering/Osaka Univ. (Japan)
Noriaki Miyanaga, Institute of Laser Engineering/Osaka Univ. (Japan)
Yasukazu Izawa, Institute of Laser Engineering/Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

© SPIE. Terms of Use
Back to Top