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Proceedings Paper

Study of deposition defects in 157-nm resist
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Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, ; doi: 10.1117/12.534971
Show Author Affiliations
Shinya Wakamizu, Tokyo Electron Kyushu Ltd. (Japan)
Takeshi Shimoaoki, Tokyo Electron Kyushu Ltd. (Japan)
Ryouichiro Naito, Tokyo Electron Kyushu Ltd. (Japan)
Junichi Kitano, Tokyo Electron Kyushu Ltd. (Japan)
Yuko Ono, Tokyo Electron Ltd. (Japan)
Etsurou Kawaguchi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takamitsu Furukawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Kentaro Matsunaga, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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