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Proceedings Paper

Nanofabrication with water-dissolvable polymer masks of polyvinyl alcohol (PVA): MxL
Author(s): Charles D. Schaper
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Paper Abstract

The paper describes the use of water-dissolvable masks, formed from a polyvinyl alcohol film forming solution, for high-resolution pattern definition and materials-transfer printing. The approach replicates surface patterns as water-soluble polymer masks (templates) by spin-casting the film-forming solution onto a master pattern. The water-soluble mask is coupled to a substrate by polymer adhesion to form a solid two-layer structure. Water is used to dissolve the mask layer to uncover the formed pattern in the adhesive layer, thereby providing a new release mechanism for contact-based methods of pattern formation. Moreover, the patterned polymer adhesion transfer process enables a large-area, conformable, single-use template addressed towards meeting registration and defect control challenges in contact printing. The process further incorporates the capability to replicate with loaded nanostructured materials to form a composite of nanoparticles in a soluble polymeric matrix with a patterned surface. The embedded particles are accessible at the surface of the template and thereby are concurrently transferred to the substrate through the polymer adhesion process and subsequently released from the soluble template after water-dissolution in a structured manner. The paper also describes applications of PVA in forming polymer masks as (a) suspended thin-film templates, (b) imprinting templates for repeated use, and (c) as templates for nanoparticle formation by collimated deposition. Polyvinyl alcohol thus provides an additional material for consideration as a mask (template) for nanofabrication, and would be an alternative to quartz, silicon, and polydimethylsiloxane (PDMS) in that regard. The class of printing techniques using PVA as a mask material is referred to as molecular transfer lithography (MxL).

Paper Details

Date Published: 20 May 2004
PDF: 12 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534928
Show Author Affiliations
Charles D. Schaper, Stanford Univ. (United States)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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