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Proceedings Paper

Analysis of mask error effect in copper damascene process
Author(s): Byungkap Kim; Il-Whan Oh; Sung-Ho Lee; Sang-Rok Hah; In-Soo Cho; Kwang-Myeon Park
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Date Published:
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Proc. SPIE 5377, Optical Microlithography XVII, ; doi: 10.1117/12.534873
Show Author Affiliations
Byungkap Kim, Samsung Electronics Co., Ltd. (South Korea)
Il-Whan Oh, Samsung Electronics Co., Ltd. (South Korea)
Sung-Ho Lee, Samsung Electronics Co., Ltd. (South Korea)
Sang-Rok Hah, Samsung Electronics Co., Ltd. (South Korea)
In-Soo Cho, Samsung Electronics Co., Ltd. (South Korea)
Kwang-Myeon Park, Samsung Electronics Co., Ltd. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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