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Proceedings Paper

EUV generation using water droplet target
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Paper Abstract

In this paper, we described a laser plasma source for Extreme Ultraviolet Lithography (EUVL) based on a water droplet target. We successfully generated stable multi-kHz water droplets with several hundred μm diameter using our experimentaql setup. We realized a good synchronization of laser with droplet by employing droplet-probing photo diode (PD) signal to trig YAG laser timely. We got EUV emission with pulse to pulse stability of 3.4% (1σ) from this droplet region without being destroyed due to hot laser plasma formation from the previous droplet.

Paper Details

Date Published: 20 May 2004
PDF: 6 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534708
Show Author Affiliations
Jing Quan Lin, MIRAI/Advanced Semiconductor Research Ctr. (Japan)
National Institute of Advanced Industrial Science and Technology (Japan)
Hidehiko Yashiro, MIRAI/Advanced Semiconductor Research Ctr. (Japan)
National Institute of Advanced Industrial Science and Technology (Japan)
Tatsuya Aota, MIRAI/Advanced Semiconductor Research Ctr. (Japan)
National Institute of Advanced Industrial Science and Technology (Japan)
Toshihisa Tomie, MIRAI/Advanced Semiconductor Research Ctr. (Japan)
National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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