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Proceedings Paper

Wet developable bottom antireflective coatings
Author(s): Tadashi Hatanaka; Shigeo Kimura; Tomoyuki Enomoto; Yasuyuki Nakajima
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Paper Abstract

Dyed photo resist and/or Top Anti-Reflective Coatings (TARC) has been used as mold in ion doping layer. However, in sub 0.25-micron pattern, this system is difficult to apply due to their poor CD control ability. As the chip size is shrunk to sub 0.25-micron in ion doping layer, the use of Organic Bottom Anti-Reflective Coatings (BARC) is strongly required. On the other hand, current Organic KrF BARCs does not dissolve in alkaline developer, and the dry etching process is indispensable in order to remove Organic BARCs. For this reason, it is difficult to apply the current Dry type Organic BARCs to the ion doping layer. To solve this problem, Wet Developable Organic BARCs to be applied to sub 0.25-micron, which have alkaline solubility have been required. NCA800 series that are the suitable alkaline developable KrF Organic BARCs, has been developed and achieved. Alkaline solubility of these BARCs was controllable by baking temperature. NCA800 series show the excellent litho performance and coating property.

Paper Details

Date Published: 14 May 2004
PDF: 9 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.534654
Show Author Affiliations
Tadashi Hatanaka, Nissan Chemical Industries, Ltd. (Japan)
Shigeo Kimura, Nissan Chemical Industries, Ltd. (Japan)
Tomoyuki Enomoto, Nissan Chemical Industries, Ltd. (Japan)
Yasuyuki Nakajima, Nissan Chemical Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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