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Proceedings Paper

Water-developable resists based on glyceryl methacrylate for 193-nm lithography
Author(s): Jin-Baek Kim; Ji-Hyun Jang; Jae-Hak Choi; Kwan-Ku Lee; Jong-Sung Ko
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Paper Abstract

Novel water-developable negative resists were designed to induce both cross-linking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced cross-linking, polarity change, and increase in dry-etch resistance. The resist formulated with this polymer and cast in a water-ethanol mixture, showed 0.7 μm line and space patterns using a mercury-xenone lamp in a contact printing mode and pure water as a developer.

Paper Details

Date Published: 14 May 2004
PDF: 9 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.534533
Show Author Affiliations
Jin-Baek Kim, Korea Advanced Institute of Science and Technology (South Korea)
Ji-Hyun Jang, Korea Advanced Institute of Science and Technology (South Korea)
Jae-Hak Choi, Korea Advanced Institute of Science and Technology (South Korea)
Kwan-Ku Lee, Korea Advanced Institute of Science and Technology (South Korea)
Jong-Sung Ko, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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