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Proceedings Paper

The synthesis and properties of N-hydroxy maleopimarimide sulfonate derivatives as PAG and inhibitor for deep-UV photoresist
Author(s): Liyuan Wang; Wenjun Wang; Xin Guo
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Paper Abstract

A few kinds of N-hydroxy maleopimarimide sulfonate derivatives were synthesized. These compounds have high solubility in commonly used solvents and high thermal stability. The UV absorption properties of these compounds in polyethylene glycol film indicate that they have suitable absorption and transparency at 193 nm wavelength. The photolysis and lithography of these compounds under radiation of low pressure Hg lamp were studied.

Paper Details

Date Published: 14 May 2004
PDF: 8 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.534513
Show Author Affiliations
Liyuan Wang, Beijing Normal Univ. (China)
Wenjun Wang, Beijing Normal Univ. (China)
Xin Guo, Beijing Normal Univ. (China)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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