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Proceedings Paper

Experimental methodology of contact edge roughness on sub-100-nm pattern
Author(s): Tae Yong Lee; Dongchul Ihm; Hyo Chun Kang; Jun Bum Lee; Byoung-Ho Lee; Soo-Bok Chin; Do-Hyun Cho; Yang Hyong Kim; Ho Dong Yang; Kyoung Mo Yang
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Paper Abstract

The measurement of edge roughness has become a hot issue in the semiconductor industry. Major vendors offer a variety of features to measure the edge roughness in their CD-SEMs. However, most of the features are limited by the applicable pattern types. For the line and space patterns, features such as Line Edge Roughness (LER) and Line Width Roughness (LWR) are available in current CD-SEMs. The edge roughness is more critical in contact process. However the measurement of contact edge roughness (CER) or contact space roughness (CSR) is more complicated than that of LER or LWR. So far, no formal standard measurement algorithm or definition of contact roughness measurement exists. In this article, currently available features are investigated to assess their representability for CER or CSR. Some new ideas to quantify CER and CSR were also suggested with preliminary experimental results.

Paper Details

Date Published: 24 May 2004
PDF: 10 pages
Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); doi: 10.1117/12.534496
Show Author Affiliations
Tae Yong Lee, Samsung Electronics Co., Ltd. (South Korea)
Dongchul Ihm, Samsung Electronics Co., Ltd. (South Korea)
Hyo Chun Kang, Samsung Electronics Co., Ltd. (South Korea)
Jun Bum Lee, Samsung Electronics Co., Ltd. (South Korea)
Byoung-Ho Lee, Samsung Electronics Co., Ltd. (South Korea)
Soo-Bok Chin, Samsung Electronics Co., Ltd. (South Korea)
Do-Hyun Cho, Samsung Electronics Co., Ltd. (South Korea)
Yang Hyong Kim, Applied Materials (Israel)
Ho Dong Yang, Applied Materials (South Korea)
Kyoung Mo Yang, Applied Materials (South Korea)


Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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