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Proceedings Paper

Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography
Author(s): Takashi Saito; Hirotoshi Inoue; Hitoshi Nagano; Masaya Yoshino; Osamu Wakabayashi; Ryoichi Nohdomi; Toshihiro Nishisaka; Akira Sumitani; Hitoshi Tomaru; Hakaru Mizoguchi
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Paper Abstract

Mass production in 193 nm lithography is now starting and its target node is moving from 90 nm to 65 nm. The main performance requirement of ArF excimer laser in this situation is high power with ultra narrow spectrum for higher throughput. The other hand, higher reliability and lower cost of ownership (CoO) are strongly hoped in mass production because CoO of ArF excimer laser is still higher than that of KrF excimer laser. We have already reported the 4 kHz ArF excimer laser for mass production, model G42A, which has an 20 W of average power, spectral bandwidth less than 0.3 pm (FWHM) and a spectral purity less than 0.75 pm (E95). We applied some technologies to G42A for achieving the high reliability and long lifetime. As a result, G42A showed the stable performance during the lifetime of over 10 billion pulses. In this paper, we report the long-term stability of G42A. And also, we introduce the reliability data of G40A series, which is the previous 4 kHz ArF excimer laser model.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.534475
Show Author Affiliations
Takashi Saito, Gigaphoton Inc. (Japan)
Hirotoshi Inoue, Gigaphoton Inc. (Japan)
Hitoshi Nagano, Gigaphoton Inc. (Japan)
Masaya Yoshino, Gigaphoton Inc. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Ryoichi Nohdomi, Gigaphoton Inc. (Japan)
Toshihiro Nishisaka, Gigaphoton Inc. (Japan)
Akira Sumitani, Komatsu Ltd. (Japan)
Hitoshi Tomaru, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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