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Proceedings Paper

Radiation-induced synergistic effects of athermal and thermal mechanisms on erosion and surface evolution of advanced electrode and condenser optics materials
Author(s): Jean Paul Allain; Ahmed Hassanein; Tatiana Burtseva; Abdellatif Yacout; Zinetulla Insepov; Sarfraz Taj; Bryan J. Rice
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Paper Abstract

In extreme ultraviolet lithography (EUVL) environments transient plasma dynamics dictate conditions for particle/surface interactions. A critical challenge facing EUVL development is optic component lifetime both in gas-discharge produced plasmas (GDPP) and laser-produced plasmas (LPP) devices. Optic components are exposed to impingent species, impurities (H,C,O,N) and debris leading to their degradation and consequently limiting 13.5 nm light reflection intensity. Experiments in the PRIME (Particles and Radiation Interaction with Matter Experiments) facility at the Argonne National Laboratory study the synergy between radiation-induced athermal and thermal mechanisms that influence the behavior of EUVL materials (electrodes and condenser optics) under irradiation conditions including: incident particle energy (50 eV - 5 keV), angle-of-incidence (near-normal to oblique), incident flux (1011-1017 ions/cm2/s), surface coatings (impurity: C,O or capping layers: Ru, W), and surface temperature (100 - 1000 C). Results of electrode and optical component interaction with singly-charged inert gases (Xe) are presented. Critical issues under study include: radiation enhanced diffusion, radiation induced segregation, preferential sputtering, collisional mixing, surface segregation, surface amorphization, thermal diffusion and thermal spike evolution. Experiments in PRIME will be complemented with atomistic modeling to study how these mechanisms modify surfaces and how these mechanisms can work synergistically to introduce solutions to enhance component lifetime of electrode and condenser optic materials.

Paper Details

Date Published: 20 May 2004
PDF: 10 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534439
Show Author Affiliations
Jean Paul Allain, Argonne National Lab. (United States)
Ahmed Hassanein, Argonne National Lab. (United States)
Tatiana Burtseva, Argonne National Lab. (United States)
Abdellatif Yacout, Argonne National Lab. (United States)
Zinetulla Insepov, Argonne National Lab. (United States)
Sarfraz Taj, Univ. of Illinois/Urbana-Champaign (United States)
Bryan J. Rice, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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