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Proceedings Paper

157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons
Author(s): Kwangjoo Lee; Steffen Jockusch; Nicholas J. Turro; Roger H. French; Robert C. Wheland; Michael F. Lemon; Andre M. Braun; Tatjana Widerschpan; Paul Zimmerman
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Paper Abstract

The advance of 157 nm as the next photolithographic wavelength has created a need to for transparent and radiation durable polymers for the use as pellicles. The most promising materials for the pellicles are fluorinated polymers, but the currently available fluorinated polymers undergo photodegradation and/or photodarkening upon exposure to 157 nm irradiation. To understand the mechanism of the photodegradation and photodarkening of fluorinated polymers, mechanistic studies on the photolysis of liquid model fluorocarbons such as, perfluoro butylethyl ether and perfluoro-2H-3-oxa-heptane, were performed employing UV, NMR, FTIR, GC, and GC/MS analysis. All hydrogen containing compounds showed decreased photostability compared to the fully perfluorinated compounds. Irradiation in the presence of atmospheric oxygen showed reduced photodarkening compared to deoxygenated samples. Irradiations were performed at 157 nm, 172 nm, 185 nm, and 254 nm and showed only minor wavelength dependence. Mechanisms for photodegradation of the fluorocarbons were proposed, where Rydberg excited states are involved.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.534381
Show Author Affiliations
Kwangjoo Lee, Columbia Univ. (United States)
Steffen Jockusch, Columbia Univ. (United States)
Nicholas J. Turro, Columbia Univ. (United States)
Roger H. French, DuPont (United States)
Robert C. Wheland, DuPont (United States)
Michael F. Lemon, DuPont (United States)
Andre M. Braun, Univ. Karlsruhe (Germany)
Tatjana Widerschpan, Univ. Karlsruhe (Germany)
Paul Zimmerman, International SEMATECH (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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