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Proceedings Paper

Validation of lithography based on the controlled movement of light-emitting particles
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Paper Abstract

A novel particle-based lithography is proposed. In this approach a particle moving in a liquid in contact with a light-sensitive substrate creates traces on that substrate (for example on a photoresist or on a photographic film). The light-emitting particle causes photochemical/photoelectric changes in the light-sensitive substrate, creating a latent image. A group of these particles can be used to write many features on the same substrate in a parallel manner. We investigate the use of electrokinetic forces to move the particles over the light-sensitive substrate. We also report on the use of high-aspect-ratio carbon MEMS (C-MEMS) electrodes as 3D dielectrophoretic traps for the light-emitting particles and investigate the feasibility of using these carbon electrodes to manipulate the light-emitting particles to trace sub-micron patterns on a light-sensitive surface. We propose two types of particle-based lithography schemes and discuss applicable scaling laws. Feasibility experiments were carried out using microscale devices.

Paper Details

Date Published: 20 May 2004
PDF: 13 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534355
Show Author Affiliations
Benjamin Yong Park, Univ. of California/Irvine (United States)
Rabih Zaouk, Univ. of California/Irvine (United States)
Marc Madou, Univ. of California/Irvine (United States)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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