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Proceedings Paper

Polarization effects in immersion lithography
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Paper Abstract

OPC tools are already equipped with the most advanced models for image formation, capable of thin-film modeling, vector diffraction modeling and polarization modeling. Accurate simulation of immersion lithography, even in the context of OPC, does not pose any particular difficulty. In this paper we use the optical simulator of Calibre to study source polarization and its impact in process latitude and in proximity and linearity curves. More than 10nm difference in both curves is observed vs. source polarization at an immersion NA>1, projected to print the 45nm node. Simulation of large and arbitrary layout snippets confirm these results and demonstrate the feasibility of using advanced models in the context of OPC. Also, dry and water-immersion lithography are compared at the same NA<1 and the main differences in imaging are highlighted. The depth-of-focus increase in immersion is confirmed both in the ambient medium and also in the available DOF in resist. The DOF simulation results correlate closely with recent experimental work from other researchers.

Paper Details

Date Published: 28 May 2004
PDF: 15 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.534322
Show Author Affiliations
Konstantinos Adam, Mentor Graphics Corp. (United States)
Wilhelm Maurer, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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