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Proceedings Paper

Plasticizer-assisted polymer imprint and transfer
Author(s): Li Tan; Yen Peng Kong; Stella W. Pang; Albert F. Yee
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Paper Abstract

We have developed a new method to pattern polymeric materials, including non-thermoplastic polymers, at low temperature and low pressure. In this method, plasticizers are added to increase the chain mobility of the polymers, resulting in lower imprinting temperature and/or pressure. Two established imprinting and transfer techniques were chosen to demonstrate this method, namely, conventional nanoimprint lithography (NIL) and microcontact printing (μCP). These two techniques were used to pattern poly(3,4-ethylenedioxythiophene) (PEDOT). PEDOT was chosen because it is a non-thermoplastic polymer and therefore cannot be easily patterned using conventional NIL. Successful imprint of PEDOT films from the PDMS mold was achieved at a low pressure of 10 kPa and 25°C by controlled addition of glycerol as a plasticizer using conventional NIL; well-defined arrays of 2μm wide, 185 nm high PEDOT dots have also been demonstrated by μCP. In contrast, patterning of PEDOT film without plasticizer requires higher temperature (80°C) and pressure (10 MPa), which could cause severe deformation of the transferred patterns. This method of plasticizer-assisted imprint lithography (PAIL) broadens the applicapability of NIL to a wide range of polymeric materials.

Paper Details

Date Published: 20 May 2004
PDF: 6 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534290
Show Author Affiliations
Li Tan, Univ. of Michigan (United States)
Yen Peng Kong, Institute of Materials Research and Engineering (Singapore)
Stella W. Pang, Univ. of Michigan (United States)
Albert F. Yee, Institute of Materials Research and Engineering (Singapore)
Univ. of Michigan (United States)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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