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Proceedings Paper

Photo-induced changes in 157-nm optical coatings
Author(s): Vladimir Liberman; Theodore M. Bloomstein; Mordechai Rothschild; Stephen T. Palmacci; Jan H. C. Sedlacek; Andrew Grenville
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Paper Abstract

The photo-induced degradation of 157-nm anti-reflective (AR) coatings, and the role of water vapor in the ambient, have been studied with in-situ spectroscopic ellipsometry, atomic force microscopy (AFM), and x-ray photoelectron spectroscopy. Using ellipsometric techniques, we find that MgF2 thin films develop a surface roughness layer under laser irradiation at an incident dose of ~0.1 MJ/cm2. These thin film changes occur well before any changes in 157-nm transmission are observed. The findings are confirmed by ex-situ post-irradiation AFM measurements. LaF3 does not exhibit this effect. Addition of ppm-levels of moisture suppresses surface roughness formation, suggesting that the surface roughness growth may be a precursor to the transmission degradation of full AR stacks that had been observed earlier.

Paper Details

Date Published: 28 May 2004
PDF: 10 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.534190
Show Author Affiliations
Vladimir Liberman, MIT Lincoln Lab. (United States)
Theodore M. Bloomstein, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
Stephen T. Palmacci, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Andrew Grenville, International SEMATECH (United States)
Intel Corp. (United States)

Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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