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Proceedings Paper

Ion damage analysis on EUV collector mirrors
Author(s): Hiroshi Komori; Georg Soumagne; Hideo Hoshino; Tamotsu Abe; Takashi Suganuma; Yousuke Imai; Akira Endo; Koichi Toyoda
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Paper Abstract

Collector mirror lifetime evaluation and damage prevention are important technical challenge for the EUV light source development. High-energy xenon ions emitted from laser-produced EUV plasmas are expected to considerably damage the collector mirror of the light source. Related to future collector mirror lifetime considerations, fast ions from the laserproduced plasma have been characterized by time-of -flight (TOF) measurements. Using a low repetition rate 8-ns, 100- mJ Nd:YAG laser, Xe+ to Xe6+ ions were observed with Xe2+ being the main charge state. In addition, the effects of fast ions on Mo/Si multilayer mirrors have been studied using a Xe ion gun. Ion sputtering of the multilayer structure is the main damage mechanism but layer boundary mixing and surface roughness increase are also observed. A magnetic confinement scheme is evaluated for ion mitigation.

Paper Details

Date Published: 20 May 2004
PDF: 8 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534060
Show Author Affiliations
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Hideo Hoshino, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Yousuke Imai, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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