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Proceedings Paper

Defect inspection of quartz-PSMs: taking a leap forward
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Paper Abstract

Defect inspection of Quartz-PSMs is challenging, as the optical contrast for defects within the quartz substrate is small. The performance of three phase contrast algorithms is studied with a variety of defect test masks. For alternating phase shift masks key parameters such as optimum focus offset, defect sensitivity for different feature sizes, as well as defect sensitivity with respect to defect printability criteria are studied. In the studied range for two of the algorithms the defect sensitivity is independent of the feature size, whereas the third algorithm exhibited a decrease in sensitivity with decreasing feature sizes. In focus runs performed on large feature sizes a single optimum focus offset is observed, whereas for small feature sizes a two-path inspection using a positive and negative focus offset is found necessary. With respect to defect printability all critical 180° defects were found. For the newest of the three algorithms good inspectability of chrome-less PSMs is achieved.

Paper Details

Date Published: 24 May 2004
PDF: 9 pages
Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); doi: 10.1117/12.534057
Show Author Affiliations
Jan P. Heumann, Advanced Mask Technology Ctr. (Germany)
Frank Schurack, Advanced Mask Technology Ctr. (Germany)
Wolfgang Dettmann, Infineon Technologies AG (Germany)
Larry Zurbrick, KLA-Tencor Corp. (United States)
Michael Lang, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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