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Proceedings Paper

High-power short-pulse laser modules for laser-produced-plasma EUV source
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Paper Abstract

We have recently made significant advances in the performance of our laser driver module employed in our laser produced plasma (LPP) EUV source. We increased the average power output from the laser whilst minimising the overall Cost of Ownership (CoO) and footprint of the system. In addition to minimising the CoO of the laser solution, it is necessary to choose an appropriate target that can attain the overall requirements of EUVL. We are currently investigating xenon in its various phases, as well as other target materials, in order to increase the conversion efficiency of the source and therefore further drive down its CoO. We have prepared a source roadmap in response to industry demands, and it shows that the combination of our demonstrated laser technology with available targets will meet the objectives for a production level source.

Paper Details

Date Published: 20 May 2004
PDF: 7 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.534015
Show Author Affiliations
Samir Ellwi, Powerlase Ltd. (United Kingdom)
Andrew Comley, Powerlase Ltd. (United Kingdom)
N. Hay, Powerlase Ltd. (United Kingdom)
Michael Brownell, Powerlase Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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