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Proceedings Paper

A high-resolution contamination-mode inspection method providing a complete solution to the inspection challenges for advanced photomasks
Author(s): Kaustuve Bhattacharyya; Yao-Tsu Huang; Kong Son; Den Wang; Louie Liu; C. H. Liao; Yi-Ming Dai; Jyh-Ching Lin
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Paper Abstract

High-resolution contamination inspection for advanced reticles remains crucial in light of the increasing trend of progressive defects such as crystal growth, haze, fungus, precipitate etc., introduced with DUV lithography, especially for low k1 processes. In most fab environments, routine incoming and re-qualification inspections for photomasks have been implemented. But although this high-resolution inspection provides necessary high-sensitivity, on advanced photomasks it often introduces inspection challenges. Aggressive OPCs and dense primary and secondary geometries are some of the many factors that can result in false-defect problems for the inspection systems. Thus, inspection needs to be desensitized. As an effort to identify a methodology to provide the inspectability while maintaining the necessary high-sensitivity, a characterization has been performed to evaluate a new combination-mode inspection. This technical paper will list the details of this special contamination inspection technique that will allow users to maintain the same high inspection throughput while providing similar or higher resolution inspection for these advanced reticles with superior inspectability.

Paper Details

Date Published: 24 May 2004
PDF: 9 pages
Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); doi: 10.1117/12.533793
Show Author Affiliations
Kaustuve Bhattacharyya, KLA-Tencor Corp. (United States)
Yao-Tsu Huang, KLA-Tencor Corp. (Taiwan)
Kong Son, KLA-Tencor Corp. (United States)
Den Wang, KLA-Tencor Corp. (Taiwan)
Louie Liu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
C. H. Liao, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yi-Ming Dai, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jyh-Ching Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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